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dc.contributor.authorSouto, Ricardo Manuel 
dc.contributor.authorIzquierdo Pérez, Javier 
dc.contributor.authorSantana, Juan José
dc.contributor.authorGonzález, Sergio
dc.date.accessioned2020-03-27T16:25:27Z
dc.date.available2020-03-27T16:25:27Z
dc.date.issued2010es_ES
dc.identifier.urihttp://riull.ull.es/xmlui/handle/915/19113
dc.description.abstractScanning electrochemical microscopy (SECM) was used to study the film formation of benzotriazole towards corrosion of copper. SECM was operated in the feedback mode by using ferrocene-methanol as redox mediator, and the sample was left unbiased at all times to freely attain its open circuit potential in the test environment. Following exposure to aggressive electrolytes the anticorrosion abilities of the layers were characterised by image analysis and by an electrochemical method derived from the experimental approach curves. Changes in the shape of the approach curves were clearly observed during the inhibitor film formation process. They showed the transition from an active conducting behaviour towards ferrocinium reoxidation typical of unprotected copper, to a surface exhibiting insulating characteristics when the metal was covered by a surface film containing the inhibitor. This supports that SECM is a practical technique in the investigation of corrosion inhibitor performance. However, a consistent tendency for the characterization of inhibitor film formation using SECM measurements in the positive feedback mode for the copper-benzotriazole system was only found when the experiments were conducted when the inhibitor molecule was not present in the test solution. That is, inhibitor molecules were found to interact not only with the copper surface during the monitoring process, but to interact with the SECM tip as well, this effect being significantly enhanced when chloride ions were present in the electrolyte. Finally, a procedure to image the chemical activity of copper surfaces partially covered with the inhibitor film with SECM is proposeden
dc.format.mimetypeapplication/pdf
dc.language.isoenes_ES
dc.relation.ispartofseriesElectrochimica Acta, 55, 8791-8800 (2010)es_ES
dc.rightsLicencia Creative Commons (Reconocimiento-No comercial-Sin obras derivadas 4.0 Internacional)
dc.rights.urihttps://creativecommons.org/licenses/by-nc-nd/4.0/deed.es_ES
dc.titleUses of scanning electrochemical microscopy for the characterization of thin inhibitor films on reactive metals: the protection of copper surfaces by benzotriazoleen
dc.typeinfo:eu-repo/semantics/article
dc.identifier.doi10.1016/j.electacta.2010.08.020
dc.subject.keywordCorrosion inhibitionen
dc.subject.keywordCopperen
dc.subject.keywordBenzotriazoleen
dc.subject.keywordScanning electrochemical microscopyen


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